This newest edition of Principles of Lithography reflects the continuing advancement of lithographic technology. In recent years, certain topics, such as line-edge roughness (LER), multi-electron-beam writers, have become more significant to practicing lithographers. As such extensive treatments...
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This newest edition of Principles of Lithography reflects the continuing advancement of lithographic technology. In recent years, certain topics, such as line-edge roughness (LER), multi-electron-beam writers, have become more significant to practicing lithographers. As such extensive treatments of these topics are provided.
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